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A new high-k/metal gate CMOS integration scheme (Diffusion and Gate Replacement) suppressing gate height asymmetry and compatible with high-thermal budget memory technologies
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1980 since deposited on 2021-10-22
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Acq. date: 2025-12-08
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1980 since deposited on 2021-10-22
1last month
1last week
Acq. date: 2025-12-08
Citations