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A new high-k/metal gate CMOS integration scheme (Diffusion and Gate Replacement) suppressing gate height asymmetry and compatible with high-thermal budget memory technologies
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1989 since deposited on 2021-10-22
3last month
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Acq. date: 2026-03-16
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Statistics
Views
1989 since deposited on 2021-10-22
3last month
2last week
Acq. date: 2026-03-16
Citations