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A new high-k/metal gate CMOS integration scheme (Diffusion and Gate Replacement) suppressing gate height asymmetry and compatible with high-thermal budget memory technologies
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1990 since deposited on 2021-10-22
Acq. date: 2026-04-26
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Statistics
Views
1990 since deposited on 2021-10-22
Acq. date: 2026-04-26
Citations