Oxygen chemiluminescence in He plasma as a method for plasma damage evaluation of Low-k dielectrics

dc.contributor.author	Urbanowicz, Adam
dc.contributor.author	Shamiryan, Denis
dc.contributor.author	Baklanov, Mikhaïl
dc.contributor.author	De Gendt, Stefan
dc.contributor.imecauthor	De Gendt, Stefan
dc.contributor.orcidimec	De Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned	2021-10-17T11:28:47Z
dc.date.available	2021-10-17T11:28:47Z
dc.date.embargo	9999-12-31
dc.date.issued	2008
dc.identifier.issn	0167-9317
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/14589
dc.source.beginpage	2164
dc.source.endpage	2168
dc.source.issue	10
dc.source.journal	Microelectronic Engineering
dc.source.volume	85
dc.title	Oxygen chemiluminescence in He plasma as a method for plasma damage evaluation of Low-k dielectrics
dc.type	Journal article
dspace.entity.type	Publication
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