Publication:
Scatterometry Application on Cu/SiCN surface topography towards high volume manufacturing
| dc.contributor.author | Chew, Soon Aik | |
| dc.contributor.author | Hung, Joey | |
| dc.contributor.author | Turovets, Igor | |
| dc.contributor.author | Saib, Mohamed | |
| dc.contributor.author | Ger, Avron | |
| dc.contributor.author | Moussa, Alain | |
| dc.contributor.author | Zhang, Boyao | |
| dc.contributor.author | De Vos, Joeri | |
| dc.contributor.author | Miller, Andy | |
| dc.contributor.author | Charley, Anne-Laure | |
| dc.contributor.author | Leray, Philippe | |
| dc.contributor.author | Beyne, Eric | |
| dc.contributor.imecauthor | Chew, Soon Aik | |
| dc.contributor.imecauthor | Saib, Mohamed | |
| dc.contributor.imecauthor | Moussa, Alain | |
| dc.contributor.imecauthor | Zhang, Boyao | |
| dc.contributor.imecauthor | De Vos, Joeri | |
| dc.contributor.imecauthor | Miller, Andy | |
| dc.contributor.imecauthor | Charley, Anne-Laure | |
| dc.contributor.imecauthor | Leray, Philippe | |
| dc.contributor.imecauthor | Beyne, Eric | |
| dc.contributor.orcidimec | Chew, Soon Aik::0000-0003-3013-4846 | |
| dc.contributor.orcidimec | Saib, Mohamed::0000-0002-5153-5553 | |
| dc.contributor.orcidimec | Moussa, Alain::0000-0002-6377-4199 | |
| dc.contributor.orcidimec | Zhang, Boyao::0000-0002-7976-0146 | |
| dc.contributor.orcidimec | De Vos, Joeri::0000-0002-9332-9336 | |
| dc.contributor.orcidimec | Miller, Andy::0000-0001-7048-2242 | |
| dc.contributor.orcidimec | Charley, Anne-Laure::0000-0003-4745-0167 | |
| dc.contributor.orcidimec | Leray, Philippe::0000-0002-1086-270X | |
| dc.contributor.orcidimec | Beyne, Eric::0000-0002-3096-050X | |
| dc.date.accessioned | 2025-04-16T08:46:15Z | |
| dc.date.available | 2025-02-15T21:13:58Z | |
| dc.date.available | 2025-04-16T08:46:15Z | |
| dc.date.issued | 2024 | |
| dc.identifier.doi | 10.1109/ESTC60143.2024.10712071 | |
| dc.identifier.eisbn | 979-8-3503-9036-0 | |
| dc.identifier.isbn | 979-8-3503-9037-7 | |
| dc.identifier.issn | 2687-9700 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/45210 | |
| dc.publisher | IEEE | |
| dc.source.conference | 10th IEEE Electronics System-Integration Technology Conference (ESTC) | |
| dc.source.conferencedate | SEP 11-13, 2024 | |
| dc.source.conferencelocation | Berlin | |
| dc.source.journal | N/A | |
| dc.source.numberofpages | 5 | |
| dc.title | Scatterometry Application on Cu/SiCN surface topography towards high volume manufacturing | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |