H2O2 decomposition and its impact on silicon surface roughening and gate oxide integrity

Publication:

1995

Journal article

Author(s)

Schmidt, Harald

;

;

Rotondaro, Antonio

;

;

Hurd, Trace

;

Hatcher, Z.

Japanese Journal of Applied Physics. Part 1

2206 since deposited on 2021-09-29

1last month

Acq. date: 2026-05-17