Publication:
H2O2 decomposition and its impact on silicon surface roughening and gate oxide integrity
Date
| dc.contributor.author | Schmidt, Harald | |
| dc.contributor.author | Meuris, Marc | |
| dc.contributor.author | Rotondaro, Antonio | |
| dc.contributor.author | Heyns, Marc | |
| dc.contributor.author | Hurd, Trace | |
| dc.contributor.author | Hatcher, Z. | |
| dc.contributor.imecauthor | Meuris, Marc | |
| dc.contributor.imecauthor | Heyns, Marc | |
| dc.contributor.orcidimec | Meuris, Marc::0000-0002-9580-6810 | |
| dc.date.accessioned | 2021-09-29T13:16:10Z | |
| dc.date.available | 2021-09-29T13:16:10Z | |
| dc.date.issued | 1995 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/853 | |
| dc.source.beginpage | 727 | |
| dc.source.endpage | 731 | |
| dc.source.issue | 2B | |
| dc.source.journal | Japanese Journal of Applied Physics. Part 1 | |
| dc.source.volume | 34 | |
| dc.title | H2O2 decomposition and its impact on silicon surface roughening and gate oxide integrity | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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