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Atomic layer deposition of Ru thin films using the zero-valence precursor EBECH Ru

Date

2014
Presentation
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dc.contributor.authorAdelmann, Christoph
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorGroven, Benjamin
dc.contributor.authorMoens, Kristof
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorFranquet, Alexis
dc.contributor.authorSwerts, Johan
dc.contributor.authorDelabie, Annelies
dc.contributor.authorVan Elshocht, Sven
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorGroven, Benjamin
dc.contributor.imecauthorMoens, Kristof
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecGroven, Benjamin::0000-0002-5781-7594
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-22T00:43:05Z
dc.date.available2021-10-22T00:43:05Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23468
dc.source.conference1st Belux Workshop on Coating, Materials, Surfaces and Interfaces
dc.source.conferencedate11/09/2014
dc.source.conferencelocationBelvaux Luxemburg
dc.title

Atomic layer deposition of Ru thin films using the zero-valence precursor EBECH Ru

dc.typeOral presentation
dspace.entity.typePublication
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