Publication:
Comparative study of the interface passivation properties of LiF and Al2O3 using silicon MIS capacitor
| dc.contributor.author | Parion, Jonathan | |
| dc.contributor.author | Scaffidi, Romain | |
| dc.contributor.author | Duerinckx, Filip | |
| dc.contributor.author | Sivaramakrishnan Radhakrishnan, Hariharsudan | |
| dc.contributor.author | Flandre, Denis | |
| dc.contributor.author | Poortmans, Jef | |
| dc.contributor.author | Vermang, Bart | |
| dc.date.accessioned | 2024-04-20T18:27:14Z | |
| dc.date.available | 2024-04-20T18:27:14Z | |
| dc.date.issued | 2024-APR 1 | |
| dc.description.wosFundingText | This study was supported by the Special Research Fund of Hasselt University, with No. BOF22OWB15. The authors thank the teams of the nanofabrication shared facility (WINFAB) and electrical characterization platform (WELCOME) at UCLouvain for their availability and technical support. | |
| dc.identifier.doi | 10.1063/5.0203484 | |
| dc.identifier.issn | 0003-6951 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/43858 | |
| dc.publisher | AIP Publishing | |
| dc.source.beginpage | 142901 | |
| dc.source.issue | 14 | |
| dc.source.journal | APPLIED PHYSICS LETTERS | |
| dc.source.numberofpages | 5 | |
| dc.source.volume | 124 | |
| dc.subject.keywords | LIGHT-EMITTING-DIODES | |
| dc.subject.keywords | ADMITTANCE SPECTROSCOPY | |
| dc.title | Comparative study of the interface passivation properties of LiF and Al2O3 using silicon MIS capacitor | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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