Publication:

Ni- and Co-based silicides for advanced CMOS applications

Date

2003
Journal article
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dc.contributor.authorKittl, Jorge
dc.contributor.authorLauwers, Anne
dc.contributor.authorChamirian, Oxana
dc.contributor.authorVan Dal, Mark
dc.contributor.authorAkheyar, Amal
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorLindsay, Richard
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorVan Dal, Mark
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-10-15T05:11:07Z
dc.date.available2021-10-15T05:11:07Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7740
dc.source.beginpage158
dc.source.endpage165
dc.source.issue2_4
dc.source.journalMicroelectronic Engineering
dc.source.volume70
dc.title

Ni- and Co-based silicides for advanced CMOS applications

dc.typeJournal article
dspace.entity.typePublication
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