Publication:
The potential of double patterning immersion lithography for the 32nm half pitch node
Date
| dc.contributor.author | Wiaux, Vincent | |
| dc.contributor.author | Storms, Greet | |
| dc.contributor.author | Cheng, Shaunee | |
| dc.contributor.author | Maenhoudt, Mireille | |
| dc.contributor.imecauthor | Wiaux, Vincent | |
| dc.date.accessioned | 2021-10-16T21:43:43Z | |
| dc.date.available | 2021-10-16T21:43:43Z | |
| dc.date.issued | 2007-08 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13225 | |
| dc.identifier.url | http://www.euroasiasemiconductor.com/print.php?id=8451 | |
| dc.source.beginpage | 19 | |
| dc.source.endpage | 22 | |
| dc.source.journal | EuroAsia Semiconductor | |
| dc.title | The potential of double patterning immersion lithography for the 32nm half pitch node | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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