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Strain and composition monitoring in various (Si)Ge fin structures using in-line HRXRD

Date

2017
Meeting abstract
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dc.contributor.authorSchulze, Andreas
dc.contributor.authorLoo, Roger
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorMertens, Hans
dc.contributor.authorCollaert, Nadine
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorWormington, Matthew
dc.contributor.authorRyan, Paul
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCaymax, Matty
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-24T13:10:52Z
dc.date.available2021-10-24T13:10:52Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29401
dc.source.conferenceFrontiers of Characterization and Metrology for Nanoelectronics - FCMN
dc.source.conferencedate21/03/2017
dc.source.conferencelocationMonterey, CA USA
dc.title

Strain and composition monitoring in various (Si)Ge fin structures using in-line HRXRD

dc.typeMeeting abstract
dspace.entity.typePublication
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