Publication:

A simulation study on process sensitivity of a line tunnel field-effect transistor

Date

2013
Journal article
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dc.contributor.authorWalke, Amey
dc.contributor.authorVandenberghe, William
dc.contributor.authorKao, Frank
dc.contributor.authorVandooren, Anne
dc.contributor.authorGroeseneken, Guido
dc.contributor.imecauthorWalke, Amey
dc.contributor.imecauthorKao, Frank
dc.contributor.imecauthorVandooren, Anne
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecVandooren, Anne::0000-0002-2412-0176
dc.date.accessioned2021-10-21T14:22:49Z
dc.date.available2021-10-21T14:22:49Z
dc.date.embargo9999-12-31
dc.date.issued2013
dc.identifier.issn0018-9383
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23367
dc.source.beginpage1019
dc.source.endpage1027
dc.source.issue3
dc.source.journalIEEE Transactions on Electron Devices
dc.source.volume60
dc.title

A simulation study on process sensitivity of a line tunnel field-effect transistor

dc.typeJournal article
dspace.entity.typePublication
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