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Formation of fluorocarbon polymer and its removal in back-end-of-line processing of advanced CMOS integrated circuits
Publication:
Formation of fluorocarbon polymer and its removal in back-end-of-line processing of advanced CMOS integrated circuits
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Date
2012-11
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Le, Quoc Toan
;
Vereecke, Guy
;
Kesters, Els
;
Struyf, Herbert
;
De Gendt, Stefan
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Abstract
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1798
since deposited on 2021-10-20
Acq. date: 2025-12-15
Citations
Metrics
Views
1798
since deposited on 2021-10-20
Acq. date: 2025-12-15
Citations