Publication:
First demonstration of vertically stacked ferroelectric Al doped HfO2 devices for NAND applications
Date
Loading...
Files
Journal
Abstract
Description
Metrics
Views
1932 since deposited on 2021-10-24
1last month
Acq. date: 2025-12-12
Citations
Metrics
Views
1932 since deposited on 2021-10-24
1last month
Acq. date: 2025-12-12
Citations