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Characteristics of low-energy nitrogen ion-implanted oxide and NO-annealed gate dielectrics
Publication:
Characteristics of low-energy nitrogen ion-implanted oxide and NO-annealed gate dielectrics
Date
2004
Journal article
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9162.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lee, Shih Chung
;
Simoen, Eddy
;
Badenes, Gonçal
Journal
Solid-State Electronics
Abstract
Description
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1886
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
Metrics
Views
1886
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations