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Characteristics of low-energy nitrogen ion-implanted oxide and NO-annealed gate dielectrics
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Characteristics of low-energy nitrogen ion-implanted oxide and NO-annealed gate dielectrics
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Date
2004
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lee, Shih Chung
;
Simoen, Eddy
;
Badenes, Gonçal
Journal
Solid-State Electronics
Abstract
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1890
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Acq. date: 2026-01-09
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Metrics
Views
1890
since deposited on 2021-10-15
1
last month
1
last week
Acq. date: 2026-01-09
Citations