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Attenuated phase shifting masks in combination with off-axis illumination: A way towards quarter micron DUV lithography for random logic operations
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Attenuated phase shifting masks in combination with off-axis illumination: A way towards quarter micron DUV lithography for random logic operations
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Date
1994
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ronse, Kurt
;
Pforr, Rainer
;
Baik, Ki-Ho
;
Jonckheere, Rik
;
Van den hove, Luc
Journal
Microelectronic Engineering
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2143
since deposited on 2021-09-29
1
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Acq. date: 2026-01-09
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Metrics
Views
2143
since deposited on 2021-09-29
1
last month
Acq. date: 2026-01-09
Citations