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Impact of post-litho linewidth roughness smoothing processes on the post-etch patterning result
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Impact of post-litho linewidth roughness smoothing processes on the post-etch patterning result
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Date
2011
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Foubert, Philippe
;
Vaglio Pret, Alessandro
;
Altamirano Sanchez, Efrain
;
Gronheid, Roel
Journal
Journal of Micro/Nanolithography MEMS and MOEMS
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1840
since deposited on 2021-10-19
Acq. date: 2026-07-17
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Views
1840
since deposited on 2021-10-19
Acq. date: 2026-07-17
Citations