Publication:
Impact of post-litho linewidth roughness smoothing processes on the post-etch patterning result
Date
| dc.contributor.author | Foubert, Philippe | |
| dc.contributor.author | Vaglio Pret, Alessandro | |
| dc.contributor.author | Altamirano Sanchez, Efrain | |
| dc.contributor.author | Gronheid, Roel | |
| dc.contributor.imecauthor | Foubert, Philippe | |
| dc.contributor.imecauthor | Vaglio Pret, Alessandro | |
| dc.contributor.imecauthor | Altamirano Sanchez, Efrain | |
| dc.contributor.imecauthor | Gronheid, Roel | |
| dc.date.accessioned | 2021-10-19T13:35:16Z | |
| dc.date.available | 2021-10-19T13:35:16Z | |
| dc.date.issued | 2011-07 | |
| dc.identifier.issn | 1537-1646 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18922 | |
| dc.identifier.url | http://spiedigitallibrary.org/jm3/resource/1/jmmmgf/v10/i3/p033001_s1 | |
| dc.source.beginpage | 33001 | |
| dc.source.issue | 3 | |
| dc.source.journal | Journal of Micro/Nanolithography MEMS and MOEMS | |
| dc.source.volume | 10 | |
| dc.title | Impact of post-litho linewidth roughness smoothing processes on the post-etch patterning result | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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