Publication:

Pattern collapse of high-aspect-ratio silicon nanostructures - A parametric study

Date

2016
Proceedings Paper
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dc.contributor.authorVrancken, Nandi
dc.contributor.authorVereecke, Guy
dc.contributor.authorBal, Stef
dc.contributor.authorSergeant, Stefanie
dc.contributor.authorDoumen, Geert
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorTerryn, Herman
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorXu, XiuMei
dc.contributor.imecauthorVrancken, Nandi
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorSergeant, Stefanie
dc.contributor.imecauthorDoumen, Geert
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorXu, XiuMei
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecSergeant, Stefanie::0000-0001-9923-0903
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecXu, XiuMei::0000-0002-3356-8693
dc.date.accessioned2021-10-23T16:56:20Z
dc.date.available2021-10-23T16:56:20Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27559
dc.identifier.urlhttp://www.scientific.net/SSP.255.136
dc.source.beginpage136
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XIII - UCPSS
dc.source.conferencedate11/09/2016
dc.source.conferencelocationKnokke-heist Belgium
dc.source.endpage140
dc.title

Pattern collapse of high-aspect-ratio silicon nanostructures - A parametric study

dc.typeProceedings paper
dspace.entity.typePublication
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