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Surface cleaning issues in thin-oxide technology

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dc.contributor.authorMertens, Paul
dc.contributor.authorBearda, Twan
dc.contributor.authorHoussa, Michel
dc.contributor.authorLoewenstein, Lee
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVos, Rita
dc.contributor.authorKenis, Karine
dc.contributor.authorNaili, Mohamed
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-14T11:30:40Z
dc.date.available2021-10-14T11:30:40Z
dc.date.embargo9999-12-31
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3673
dc.source.conference30th IEEE Semiconductor Interface Specialists' Conference
dc.source.conferencedate2/12/1999
dc.source.conferencelocationCharleston, VA USA
dc.title

Surface cleaning issues in thin-oxide technology

dc.typeOral presentation
dspace.entity.typePublication
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