Publication:

Plasma modification of Hf based high-k dielectrics: effect of nitridation and silicon nitride deposition

Date

2004
Proceedings Paper
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dc.contributor.authorTsai, W.
dc.contributor.authorMaes, J.W.
dc.contributor.authorDe Witte, Hilde
dc.contributor.authorChen, J.
dc.contributor.authorDelabie, Annelies
dc.contributor.authorCarter, Richard
dc.contributor.authorRichard, Olivier
dc.contributor.authorCaymax, Matty
dc.contributor.authorConard, Thierry
dc.contributor.authorYoung, Edward
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-15T16:43:12Z
dc.date.available2021-10-15T16:43:12Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9691
dc.source.beginpage37
dc.source.conferencePhysics and Technology of High-k Gate Dielectrics II
dc.source.conferencedate12/10/2003
dc.source.conferencelocationOrlando, FL USA
dc.source.endpage46
dc.title

Plasma modification of Hf based high-k dielectrics: effect of nitridation and silicon nitride deposition

dc.typeProceedings paper
dspace.entity.typePublication
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