Publication:

A controlled deposition of organic contamination and the removal with ozone based cleaning

Date

2001
Proceedings Paper
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dc.contributor.authorClaes, Martine
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorKenens, Conny
dc.contributor.authorConard, Thierry
dc.contributor.authorBender, Hugo
dc.contributor.authorStorm, Wolfgang
dc.contributor.authorBauer, T.
dc.contributor.authorLagrange, Sébastien
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.accessioned2021-10-14T16:41:47Z
dc.date.available2021-10-14T16:41:47Z
dc.date.embargo9999-12-31
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5142
dc.source.beginpage223
dc.source.conferenceUltra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS
dc.source.conferencedate18/09/2000
dc.source.conferencelocationOostende Belgium
dc.source.endpage226
dc.title

A controlled deposition of organic contamination and the removal with ozone based cleaning

dc.typeProceedings paper
dspace.entity.typePublication
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