Publication:

Quantified Uniformity and Selectivity of TiO2 Films in 45-nm Half Pitch Patterns Using Area-Selective Deposition Supercycles

Date

2023
Journal article
https://doi.org/10.1002/admi.202300163
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dc.contributor.authorNye, Rachel
dc.contributor.authorVan Dongen, Kaat
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorParsons, Gregory N. N.
dc.contributor.authorDelabie, Annelies
dc.contributor.imecauthorVan Dongen, Kaat
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorNye, Rachel
dc.contributor.orcidimecde Marneffe, Jean-Francois::0000-0001-5178-6670
dc.contributor.orcidimecDelabie, Annelies::0000-0001-9739-7419
dc.date.accessioned2023-12-15T09:53:24Z
dc.date.available2023-06-25T20:34:42Z
dc.date.available2023-12-15T09:53:24Z
dc.date.embargo2023-07-17
dc.date.issued2023
dc.identifier.doi10.1002/admi.202300163
dc.identifier.issn2196-7350
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42091
dc.publisherWILEY
dc.source.beginpageArt. 2300163
dc.source.endpagena
dc.source.issue20
dc.source.journalADVANCED MATERIALS INTERFACES
dc.source.numberofpages11
dc.source.volume10
dc.subject.keywordsATOMIC LAYER DEPOSITION
dc.subject.keywordsRUTHENIUM
dc.title

Quantified Uniformity and Selectivity of TiO2 Films in 45-nm Half Pitch Patterns Using Area-Selective Deposition Supercycles

dc.typeJournal article
dspace.entity.typePublication
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