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Cu/LKD-5109 damascene integration demonstration using FF-02 low-k spin-on hard-mask and embedded etch-stop

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dc.contributor.authorKokubo, Terukazu
dc.contributor.authorDas, Arabinda
dc.contributor.authorFurukawa, Yukiko
dc.contributor.authorVos, Ingrid
dc.contributor.authorIacopi, Francesca
dc.contributor.authorStruyf, Herbert
dc.contributor.authorVan Aelst, Joke
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorTokei, Zsolt
dc.contributor.authorVervoort, Iwan
dc.contributor.authorBender, Hugo
dc.contributor.authorStucchi, Michele
dc.contributor.authorSchaekers, Marc
dc.contributor.authorBoullart, Werner
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorPeterson, William
dc.contributor.authorShiota, A.
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorVos, Ingrid
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorVan Aelst, Joke
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.accessioned2021-10-14T22:04:27Z
dc.date.available2021-10-14T22:04:27Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6493
dc.source.beginpage51
dc.source.conferenceProceedings of the IEEE International Interconnect Technology Conference
dc.source.conferencedate3/06/2002
dc.source.conferencelocationBurlingame, CA USA
dc.source.endpage53
dc.title

Cu/LKD-5109 damascene integration demonstration using FF-02 low-k spin-on hard-mask and embedded etch-stop

dc.typeProceedings paper
dspace.entity.typePublication
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