Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-chi Block Copolymers

Pound-Lana, Gwenaelle; Bezard, Philippe; Petit-Etienne, Camille; Cavalaglio, Sebastien; Cunge, Gilles; Cabannes-Boue, Benjamin; Fleury, Guillaume; Chevalier, Xavier; Zelsmann, Marc

doi:10.1021/acsami.1c13503

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Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-chi Block Copolymers

Date

2021

Journal article

https://doi.org/10.1021/acsami.1c13503

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Author(s)

Pound-Lana, Gwenaelle

;

Bezard, Philippe

;

Petit-Etienne, Camille

;

Cavalaglio, Sebastien

;

Cunge, Gilles

;

Cabannes-Boue, Benjamin

;

Fleury, Guillaume

;

Chevalier, Xavier

;

Zelsmann, Marc

Journal

ACS APPLIED MATERIALS & INTERFACES

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Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-chi Block Copolymers

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