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Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-chi Block Copolymers
Publication:
Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-chi Block Copolymers
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Date
2021
Journal article
https://doi.org/10.1021/acsami.1c13503
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Pound-Lana, Gwenaelle
;
Bezard, Philippe
;
Petit-Etienne, Camille
;
Cavalaglio, Sebastien
;
Cunge, Gilles
;
Cabannes-Boue, Benjamin
;
Fleury, Guillaume
;
Chevalier, Xavier
;
Zelsmann, Marc
Journal
ACS APPLIED MATERIALS & INTERFACES
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Downloads
1691
since deposited on 2023-06-20
268
last month
12
last week
Acq. date: 2025-12-13
Views
1164
since deposited on 2023-06-20
5
last month
1
last week
Acq. date: 2025-12-13
Citations