Publication:

Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-chi Block Copolymers

Date

2021
Journal article
https://doi.org/10.1021/acsami.1c13503
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dc.contributor.authorPound-Lana, Gwenaelle
dc.contributor.authorBezard, Philippe
dc.contributor.authorPetit-Etienne, Camille
dc.contributor.authorCavalaglio, Sebastien
dc.contributor.authorCunge, Gilles
dc.contributor.authorCabannes-Boue, Benjamin
dc.contributor.authorFleury, Guillaume
dc.contributor.authorChevalier, Xavier
dc.contributor.authorZelsmann, Marc
dc.contributor.imecauthorBezard, Philippe
dc.contributor.orcidextPetit-Etienne, Camille::0000-0003-4199-5529
dc.contributor.orcidextChevalier, Xavier::0000-0001-7397-7849
dc.date.accessioned2023-08-09T08:40:23Z
dc.date.available2023-06-20T10:36:42Z
dc.date.available2023-08-09T08:40:23Z
dc.date.embargo2021-10-12
dc.date.issued2021
dc.identifier.doi10.1021/acsami.1c13503
dc.identifier.issn1944-8244
dc.identifier.pmidMEDLINE:34636239
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41957
dc.publisherAMER CHEMICAL SOC
dc.source.beginpage49184
dc.source.endpage49193
dc.source.issue41
dc.source.journalACS APPLIED MATERIALS & INTERFACES
dc.source.numberofpages10
dc.source.volume13
dc.title

Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-chi Block Copolymers

dc.typeJournal article
dspace.entity.typePublication
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