Publication:

Junction formation in Ge by ion implantation

Date

2007-05
Proceedings Paper
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dc.contributor.authorSatta, Alessandra
dc.contributor.authorSimoen, Eddy
dc.contributor.authorVan Daele, Benny
dc.contributor.authorClarysse, Trudo
dc.contributor.authorNicholas, Gareth
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorAnwand, Wolfgang
dc.contributor.authorSkorupa, Wolfgang
dc.contributor.authorPeaker, Tony
dc.contributor.authorMarchevic, Vladimir
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.accessioned2021-10-16T19:23:54Z
dc.date.available2021-10-16T19:23:54Z
dc.date.embargo9999-12-31
dc.date.issued2007-05
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12842
dc.source.beginpage297
dc.source.conferenceProceedings International Workshop on INSIGHT in Semiconductor Device Fabrication, Metrology, and Modeling - INSIGHT
dc.source.conferencedate6/05/2007
dc.source.conferencelocationNapa, CA USA
dc.source.endpage304
dc.title

Junction formation in Ge by ion implantation

dc.typeProceedings paper
dspace.entity.typePublication
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