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Approaches to Enable Patterning of Tight Pitches towards High NA EUV
Publication:
Approaches to Enable Patterning of Tight Pitches towards High NA EUV
Date
2022
Proceedings Paper
https://doi.org/10.1117/12.2614012
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Tadatomo, Hiroki
;
Dauendorffer, Arnaud
;
Onitsuka, Tomoya
;
Genjima, Hisashi
;
Ido, Yasuyuki
;
Okada, Soichiro
;
Kuwahara, Yuhei
;
Hara, Arisa
;
Dinh, Congque
;
Fujimoto, Seiji
;
Kawakami, Shinichiro
;
Muramatsu, Makoto
;
Shimura, Satoru
;
Nafus, Kathleen
;
Oikawa, Noriaki
;
Ono, Kenta
;
Feurprier, Yannick
;
Demand, Marc
;
Negreira, Ainhoa Romo
;
Nagahara, Seiji
;
Blanco, Victor
;
Foubert, Philippe
;
De Simone, Danilo
Journal
Proceedings of SPIE
Abstract
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1441
since deposited on 2022-09-08
Acq. date: 2025-10-24
Citations
Metrics
Views
1441
since deposited on 2022-09-08
Acq. date: 2025-10-24
Citations