Publication:
Approaches to Enable Patterning of Tight Pitches towards High NA EUV
| dc.contributor.author | Tadatomo, Hiroki | |
| dc.contributor.author | Dauendorffer, Arnaud | |
| dc.contributor.author | Onitsuka, Tomoya | |
| dc.contributor.author | Genjima, Hisashi | |
| dc.contributor.author | Ido, Yasuyuki | |
| dc.contributor.author | Okada, Soichiro | |
| dc.contributor.author | Kuwahara, Yuhei | |
| dc.contributor.author | Hara, Arisa | |
| dc.contributor.author | Dinh, Congque | |
| dc.contributor.author | Fujimoto, Seiji | |
| dc.contributor.author | Kawakami, Shinichiro | |
| dc.contributor.author | Muramatsu, Makoto | |
| dc.contributor.author | Shimura, Satoru | |
| dc.contributor.author | Nafus, Kathleen | |
| dc.contributor.author | Oikawa, Noriaki | |
| dc.contributor.author | Ono, Kenta | |
| dc.contributor.author | Feurprier, Yannick | |
| dc.contributor.author | Demand, Marc | |
| dc.contributor.author | Negreira, Ainhoa Romo | |
| dc.contributor.author | Nagahara, Seiji | |
| dc.contributor.imecauthor | Blanco, Victor | |
| dc.contributor.imecauthor | Foubert, Philippe | |
| dc.contributor.imecauthor | De Simone, Danilo | |
| dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
| dc.contributor.orcidimec | Blanco, Victor::0000-0003-4308-0381 | |
| dc.date.accessioned | 2023-01-04T10:50:41Z | |
| dc.date.available | 2022-09-08T02:39:18Z | |
| dc.date.available | 2023-01-04T10:50:41Z | |
| dc.date.issued | 2022 | |
| dc.identifier.doi | 10.1117/12.2614012 | |
| dc.identifier.eisbn | 978-1-5106-4988-0 | |
| dc.identifier.isbn | 978-1-5106-4987-3 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40392 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | 120560F | |
| dc.source.conference | Conference on Advanced Etch Technology and Process Integration for Nanopatterning XI Part of SPIE Advanced Lithography and Patterning Conference | |
| dc.source.conferencedate | APR 24-MAY 27, 2020-2022 | |
| dc.source.conferencelocation | San Jose | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 7 | |
| dc.source.volume | 12056 | |
| dc.title | Approaches to Enable Patterning of Tight Pitches towards High NA EUV | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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