Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
Dependence of electric potential at trench surfaces on ion angula distribution in plasma etching processes
Publication:
Dependence of electric potential at trench surfaces on ion angula distribution in plasma etching processes
Copy permalink
Date
2016
Journal article
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
33030.pdf
952.92 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Palov, A
;
Mankelevich, Y
;
Rakhimova, T
;
Baklanov, Mikhaïl
Journal
Journal of Physics D: Applied Physics
Abstract
Description
Metrics
Views
1893
since deposited on 2021-10-23
Acq. date: 2026-01-08
Citations
Metrics
Views
1893
since deposited on 2021-10-23
Acq. date: 2026-01-08
Citations