Dependence of electric potential at trench surfaces on ion angula distribution in plasma etching processes

dc.contributor.author	Palov, A
dc.contributor.author	Mankelevich, Y
dc.contributor.author	Rakhimova, T
dc.contributor.author	Baklanov, Mikhaïl
dc.date.accessioned	2021-10-23T13:29:51Z
dc.date.available	2021-10-23T13:29:51Z
dc.date.embargo	9999-12-31
dc.date.issued	2016
dc.identifier.issn	0022-3727
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/27112
dc.source.beginpage	105203
dc.source.issue	10
dc.source.journal	Journal of Physics D: Applied Physics
dc.source.volume	49
dc.title	Dependence of electric potential at trench surfaces on ion angula distribution in plasma etching processes
dc.type	Journal article
dspace.entity.type	Publication
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