Publication:

Dissociative photoionization of EUV lithography photoresist models

Date

2023
Proceedings Paper
https://doi.org/10.1117/12.2657702
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Author(s)

Gentile, Marzio  
;
Gerlach, Marius
;
Richter, Robert
;
van Setten, Michiel  
;
Petersen, John  
;
van der Heide, Paul  
;
Holzmeier, Fabian  

Journal

Proceedings of SPIE

Abstract

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1120 since deposited on 2023-07-28
Acq. date: 2025-10-29

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1120 since deposited on 2023-07-28
Acq. date: 2025-10-29

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