Publication:

Dissociative photoionization of EUV lithography photoresist models

Date

2023

Proceedings Paper

https://doi.org/10.1117/12.2657702

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Author(s)

Gentile, Marzio

;

Gerlach, Marius

;

Richter, Robert

;

van Setten, Michiel

;

;

van der Heide, Paul

;

Holzmeier, Fabian

Journal

Proceedings of SPIE

Metrics

1121 since deposited on 2023-07-28

Acq. date: 2026-01-06