Publication:
Dissociative photoionization of EUV lithography photoresist models
| dc.contributor.author | Gentile, Marzio | |
| dc.contributor.author | Gerlach, Marius | |
| dc.contributor.author | Richter, Robert | |
| dc.contributor.author | van Setten, Michiel | |
| dc.contributor.author | Petersen, John | |
| dc.contributor.author | van der Heide, Paul | |
| dc.contributor.author | Holzmeier, Fabian | |
| dc.contributor.imecauthor | Gentile, Marzio | |
| dc.contributor.imecauthor | van Setten, Michiel | |
| dc.contributor.imecauthor | Petersen, John | |
| dc.contributor.imecauthor | van der Heide, Paul | |
| dc.contributor.imecauthor | Holzmeier, Fabian | |
| dc.contributor.orcidimec | van der Heide, Paul::0000-0001-6292-0329 | |
| dc.contributor.orcidimec | Holzmeier, Fabian::0000-0001-8749-5330 | |
| dc.contributor.orcidimec | Gentile, Marzio::0000-0001-5877-3274 | |
| dc.contributor.orcidimec | van Setten, Michiel::0000-0003-0557-5260 | |
| dc.contributor.orcidimec | Petersen, John::0000-0003-4815-3770 | |
| dc.date.accessioned | 2023-11-07T08:12:52Z | |
| dc.date.available | 2023-07-28T17:39:47Z | |
| dc.date.available | 2023-11-07T08:12:52Z | |
| dc.date.issued | 2023 | |
| dc.description.wosFundingText | MGG acknowledges financial support The Research Foundation - Flanders (FWO) for a travel grant. MG acknowledges funding by the Deutsche Forschungsgemeinschaft, contract F1575/13-2. | |
| dc.identifier.doi | 10.1117/12.2657702 | |
| dc.identifier.eisbn | 978-1-5106-6104-2 | |
| dc.identifier.isbn | 978-1-5106-6103-5 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/42229 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | Art. 124980S | |
| dc.source.conference | Conference on Advances in Patterning Materials and Processes XL | |
| dc.source.conferencedate | FEB 27-MAR 01, 2023 | |
| dc.source.conferencelocation | San Jose | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 10 | |
| dc.source.volume | 12498 | |
| dc.title | Dissociative photoionization of EUV lithography photoresist models | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |