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Towards understanding degradation and breakdown of SiO2/high-k stacks

Date

2002
Proceedings Paper
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dc.contributor.authorKauerauf, Thomas
dc.contributor.authorDegraeve, Robin
dc.contributor.authorCartier, Eduard
dc.contributor.authorGovoreanu, Bogdan
dc.contributor.authorBlomme, Pieter
dc.contributor.authorKaczer, Ben
dc.contributor.authorPantisano, Luigi
dc.contributor.authorKerber, Andreas
dc.contributor.authorGroeseneken, Guido
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorGovoreanu, Bogdan
dc.contributor.imecauthorBlomme, Pieter
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.date.accessioned2021-10-14T22:00:00Z
dc.date.available2021-10-14T22:00:00Z
dc.date.embargo9999-12-31
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6467
dc.source.beginpage521
dc.source.conferenceIEDM Technical Digest
dc.source.conferencedate9/12/2002
dc.source.conferencelocationSan Francisco, CA USA
dc.source.endpage524
dc.title

Towards understanding degradation and breakdown of SiO2/high-k stacks

dc.typeProceedings paper
dspace.entity.typePublication
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