Publication:

Integrated approach to improving local CD uniformity in EUV patterning

Date

2017
Proceedings Paper
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dc.contributor.authorLiang, Andrew
dc.contributor.authorHermans, Jan
dc.contributor.authorTran, Tim
dc.contributor.authorViatkina, Katja
dc.contributor.authorLiang, Chen-Wei
dc.contributor.authorWard, Brandon
dc.contributor.authorChuang, Steven
dc.contributor.authorYu, Jengyi
dc.contributor.authorHarm, Greg
dc.contributor.authorVandereyken, Jelle
dc.contributor.authorRio, David
dc.contributor.authorKubis, Michael
dc.contributor.authorTan, Samantha
dc.contributor.authorWise, Rich
dc.contributor.authorDusa, Mircea
dc.contributor.authorReddy, Sirish
dc.contributor.authorSinghal, Akhil
dc.contributor.authorVan Schravendijk, Bart
dc.contributor.authorDixit, Girish
dc.contributor.authorShamma, Nader
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorVandereyken, Jelle
dc.contributor.imecauthorRio, David
dc.contributor.imecauthorDusa, Mircea
dc.contributor.imecauthorDixit, Girish
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.accessioned2021-10-24T07:55:18Z
dc.date.available2021-10-24T07:55:18Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28815
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2614223
dc.source.beginpage1014319
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VIII
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
dc.title

Integrated approach to improving local CD uniformity in EUV patterning

dc.typeProceedings paper
dspace.entity.typePublication
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