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Conference contributions
Effect of water on resist performance beyond resolution enhancement in 193nm immersion lithography
Publication:
Effect of water on resist performance beyond resolution enhancement in 193nm immersion lithography
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Date
2005
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kim, Hyun-Woo
;
Delvaux, Christie
;
Baerts, Christina
;
Gronheid, Roel
;
Foubert, Philippe
;
Kishimura, Shinji
;
Ercken, Monique
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1971
since deposited on 2021-10-16
3
last month
Acq. date: 2025-12-09
Citations
Metrics
Views
1971
since deposited on 2021-10-16
3
last month
Acq. date: 2025-12-09
Citations