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Effect of water on resist performance beyond resolution enhancement in 193nm immersion lithography

Date

2005
Proceedings Paper
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dc.contributor.authorKim, Hyun-Woo
dc.contributor.authorDelvaux, Christie
dc.contributor.authorBaerts, Christina
dc.contributor.authorGronheid, Roel
dc.contributor.authorFoubert, Philippe
dc.contributor.authorKishimura, Shinji
dc.contributor.authorErcken, Monique
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorBaerts, Christina
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorErcken, Monique
dc.date.accessioned2021-10-16T02:32:01Z
dc.date.available2021-10-16T02:32:01Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10696
dc.source.conference2nd International Symposium on Immersion Lithography
dc.source.conferencedate12/09/2005
dc.source.conferencelocationBrugge Belgium
dc.title

Effect of water on resist performance beyond resolution enhancement in 193nm immersion lithography

dc.typeProceedings paper
dspace.entity.typePublication
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