Publication:
The influence of the initial LWR, CD and EUV-resist composition on LWR reduction by H2 plasma treatment
Date
| dc.contributor.author | De Schepper, Peter | |
| dc.contributor.author | Altamirano Sanchez, Efrain | |
| dc.contributor.author | Hansen, Terje | |
| dc.contributor.author | Boullart, Werner | |
| dc.contributor.author | De Gendt, Stefan | |
| dc.contributor.imecauthor | De Schepper, Peter | |
| dc.contributor.imecauthor | Altamirano Sanchez, Efrain | |
| dc.contributor.imecauthor | Boullart, Werner | |
| dc.contributor.imecauthor | De Gendt, Stefan | |
| dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
| dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
| dc.date.accessioned | 2021-10-22T01:08:33Z | |
| dc.date.available | 2021-10-22T01:08:33Z | |
| dc.date.issued | 2014 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/23719 | |
| dc.source.conference | SPIE Advanced Lithography | |
| dc.source.conferencedate | 22/02/2014 | |
| dc.source.conferencelocation | San Jose, CA USa | |
| dc.title | The influence of the initial LWR, CD and EUV-resist composition on LWR reduction by H2 plasma treatment | |
| dc.type | Meeting abstract | |
| dspace.entity.type | Publication | |
| Files | ||
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