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A Laboratory Light Source for Ultrafast Kinetics of EUV Exposure Processes and Ultra-Small Pitch Lithography
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A Laboratory Light Source for Ultrafast Kinetics of EUV Exposure Processes and Ultra-Small Pitch Lithography
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Date
2020
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Cousin, Seth L.
;
Bargsten, Clayton
;
Rinard, Eric
;
Ward, Rod
;
Hosler, Erik
;
Petersen, Brennan
;
Kapteyn, Henity
;
Vanelderen, Pieter
;
Petersen, John
;
van der Heide, Paul
Journal
na
Abstract
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1808
since deposited on 2021-11-02
Acq. date: 2025-12-15
Citations
Metrics
Views
1808
since deposited on 2021-11-02
Acq. date: 2025-12-15
Citations