Publication:

A Laboratory Light Source for Ultrafast Kinetics of EUV Exposure Processes and Ultra-Small Pitch Lithography

Date

2020
Proceedings Paper
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dc.contributor.authorCousin, Seth L.
dc.contributor.authorBargsten, Clayton
dc.contributor.authorRinard, Eric
dc.contributor.authorWard, Rod
dc.contributor.authorHosler, Erik
dc.contributor.authorPetersen, Brennan
dc.contributor.authorKapteyn, Henity
dc.contributor.authorVanelderen, Pieter
dc.contributor.authorPetersen, John
dc.contributor.authorvan der Heide, Paul
dc.contributor.imecauthorVanelderen, Pieter
dc.contributor.imecauthorPetersen, John
dc.contributor.imecauthorvan der Heide, Paul
dc.contributor.orcidimecvan der Heide, Paul::0000-0001-6292-0329
dc.date.accessioned2022-01-25T09:23:13Z
dc.date.available2021-11-02T16:05:07Z
dc.date.available2022-01-25T09:23:13Z
dc.date.issued2020
dc.identifier.eisbn978-1-943580-76-7
dc.identifier.issn2160-9020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38187
dc.publisherIEEE
dc.source.conferenceConference on Lasers and Electro-Optics (CLEO)
dc.source.conferencedateMAY 10-15, 2020
dc.source.conferencelocationSan Jose
dc.source.journalna
dc.source.numberofpages2
dc.title

A Laboratory Light Source for Ultrafast Kinetics of EUV Exposure Processes and Ultra-Small Pitch Lithography

dc.typeProceedings paper
dspace.entity.typePublication
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