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SOI thickness uniformity improvement using wafer-scale corrective etching for silicon nano-photonic device
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SOI thickness uniformity improvement using wafer-scale corrective etching for silicon nano-photonic device
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Date
2011
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Selvaraja, Shankar
;
Rosseel, Erik
;
Fernandez, Luis
;
Tabat, Martin
;
Bogaerts, Wim
;
Hautala, John
;
Absil, Philippe
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Acq. date: 2025-12-12
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Downloads
1
since deposited on 2021-10-19
Acq. date: 2025-12-12
Views
1894
since deposited on 2021-10-19
3
last month
Acq. date: 2025-12-12
Citations