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SOI thickness uniformity improvement using wafer-scale corrective etching for silicon nano-photonic device

Date

2011
Proceedings Paper
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dc.contributor.authorSelvaraja, Shankar
dc.contributor.authorRosseel, Erik
dc.contributor.authorFernandez, Luis
dc.contributor.authorTabat, Martin
dc.contributor.authorBogaerts, Wim
dc.contributor.authorHautala, John
dc.contributor.authorAbsil, Philippe
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.date.accessioned2021-10-19T18:40:49Z
dc.date.available2021-10-19T18:40:49Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19762
dc.source.beginpage289
dc.source.conferenceProceedings of the Annual Symposium of the IEEE Photonics Benelux Chapter
dc.source.conferencedate1/12/2011
dc.source.conferencelocationGent Belgium
dc.source.endpage292
dc.title

SOI thickness uniformity improvement using wafer-scale corrective etching for silicon nano-photonic device

dc.typeProceedings paper
dspace.entity.typePublication
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