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Integration of ferroelectric SrBi2Ta2O9-based capacitors in 0.35 μm CMOS technology

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dc.contributor.authorLisoni, Judit
dc.contributor.authorJohnson, Jo
dc.contributor.authorGoux, Ludovic
dc.contributor.authorSchwitters, Michael
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorMaes, David
dc.contributor.authorHaspeslagh, Luc
dc.contributor.authorCaputa, Concetta
dc.contributor.authorCasella, P.
dc.contributor.authorZambrano, R.
dc.contributor.authorVecchio, G.
dc.contributor.authorMonchoix, H.
dc.contributor.authorVan Autryve, Luc
dc.contributor.authorWouters, Dirk
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorHaspeslagh, Luc
dc.contributor.imecauthorVan Autryve, Luc
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.contributor.orcidimecHaspeslagh, Luc::0000-0003-3561-3387
dc.date.accessioned2021-10-15T14:30:31Z
dc.date.available2021-10-15T14:30:31Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9212
dc.source.beginpageS78
dc.source.endpageS82
dc.source.issueS1
dc.source.journalPhysica Status Solidi C
dc.source.volume1
dc.title

Integration of ferroelectric SrBi2Ta2O9-based capacitors in 0.35 μm CMOS technology

dc.typeJournal article
dspace.entity.typePublication
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