Publication:

Compensation of overlay errors due to mask bending and non-flatness for EUV masks

Date

2009
Proceedings Paper
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dc.contributor.authorChandhok, Manish
dc.contributor.authorGoyal, Sanjay
dc.contributor.authorCarson, Steve
dc.contributor.authorPark, Seh-Jin
dc.contributor.authorZhang, Guojing
dc.contributor.authorMyers, Alan
dc.contributor.authorLeeson, Michael
dc.contributor.authorKamna, Marilyn
dc.contributor.authorMartinez, Fabian
dc.contributor.authorStivers, Alan
dc.contributor.authorLorusso, Gian
dc.contributor.authorHermans, Jan
dc.contributor.authorHendrickx, Eric
dc.contributor.authorGovindjee, Sanjay
dc.contributor.authorBrandstetter, Gerd
dc.contributor.authorLaursen, Tod
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.accessioned2021-10-17T21:32:52Z
dc.date.available2021-10-17T21:32:52Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15078
dc.source.beginpage72710G
dc.source.conferenceAlternative Lithographic Technologies
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose, CA USA
dc.title

Compensation of overlay errors due to mask bending and non-flatness for EUV masks

dc.typeProceedings paper
dspace.entity.typePublication
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