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Impact of EUV lithography line edge roughness on 16 nm memory generation
Publication:
Impact of EUV lithography line edge roughness on 16 nm memory generation
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Date
2011
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22531.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vaglio Pret, Alessandro
;
Poliakov, Pavel
;
Bianchi, Davide
;
Gronheid, Roel
;
Blomme, Pieter
;
Miranda Corbalan, Miguel
;
Van Houdt, Jan
;
Dehaene, Wim
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1919
since deposited on 2021-10-19
1
last month
Acq. date: 2025-12-10
Citations