Publication:
Surface termination of HfO2 in W/HfO2 gated metal-oxide-semiconductor stacks from thermal stability point of view
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1945 since deposited on 2021-10-17
6last month
2last week
Acq. date: 2025-12-09
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Metrics
Views
1945 since deposited on 2021-10-17
6last month
2last week
Acq. date: 2025-12-09
Citations