Publication:

Resolving In Situ Exposure Dynamics in a Chemically Amplified EUV Photoresist Using Table-Top EUV Photoemission Spectroscopy

Date

2025
Journal article
https://doi.org/10.1021/acsami.5c09589
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Author(s)

Singh, Dhirendra  
;
Galleni, Laura  
;
Sajjadian, Faegheh  
;
Pollentier, Ivan  
;
Holzmeier, Fabian  
;
Pourtois, Geoffrey  
;
De Gendt, Stefan  
;
van Setten, Michiel  
;
Conard, Thierry  
;
Petersen, John  
;
van der Heide, Paul  
;
Dorney, Kevin  

Journal

ACS APPLIED MATERIALS & INTERFACES

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