Publication:

Resolving In Situ Exposure Dynamics in a Chemically Amplified EUV Photoresist Using Table-Top EUV Photoemission Spectroscopy

Date

2025
Journal article
https://doi.org/10.1021/acsami.5c09589
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dc.contributor.authorSingh, Dhirendra
dc.contributor.authorGalleni, Laura
dc.contributor.authorSajjadian, Faegheh
dc.contributor.authorPollentier, Ivan
dc.contributor.authorHolzmeier, Fabian
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorvan Setten, Michiel
dc.contributor.authorConard, Thierry
dc.contributor.authorPetersen, John
dc.contributor.authorvan der Heide, Paul
dc.contributor.authorDorney, Kevin
dc.date.accessioned2026-02-02T15:10:09Z
dc.date.available2026-02-02T15:10:09Z
dc.date.createdwos2025-09-11
dc.date.issued2025
dc.description.wosFundingTextD.P.S. and K.M.D. acknowledge funding from the European Union's Horizon 2020 research and innovation program under the Marie Sklodowska-Curie grant agreement nos. 101032241 (D.P.S.) and 101031245 (K.M.D.). We also gratefully acknowledge FUJIFILM for providing the model ESCAP material used in this work. We would also like to thank Esben W. Larsen, Anja Vanleenhove, Roberto Fallica, and Danilo De Simone for their support and assistance.
dc.identifier.doi10.1021/acsami.5c09589
dc.identifier.issn1944-8244
dc.identifier.pmidMEDLINE:40912685
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/58773
dc.language.isoeng
dc.provenance.editstepusergreet.vanhoof@imec.be
dc.publisherAMER CHEMICAL SOC
dc.source.beginpage52567
dc.source.endpage52579
dc.source.issue37
dc.source.journalACS APPLIED MATERIALS & INTERFACES
dc.source.numberofpages13
dc.source.volume17
dc.subject.keywordsBASIS-SETS
dc.subject.keywordsPSEUDOPOTENTIALS
dc.title

Resolving In Situ Exposure Dynamics in a Chemically Amplified EUV Photoresist Using Table-Top EUV Photoemission Spectroscopy

dc.typeJournal article
dspace.entity.typePublication
imec.internal.crawledAt2025-10-22
imec.internal.sourcecrawler
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