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Effect of deposition and anneal temperature on batch-ALD deposited ZrO2/Al2O3/ZrO2 films for DRAM MIM capacitor applications
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1966 since deposited on 2021-10-17
Acq. date: 2025-10-23
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1966 since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations