Publication:
Effect of deposition and anneal temperature on batch-ALD deposited ZrO2/Al2O3/ZrO2 films for DRAM MIM capacitor applications
Date
Loading...
Files
Journal
Abstract
Description
Metrics
Views
1970 since deposited on 2021-10-17
1last month
Acq. date: 2025-12-08
Citations
Metrics
Views
1970 since deposited on 2021-10-17
1last month
Acq. date: 2025-12-08
Citations