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Effect of deposition and anneal temperature on batch-ALD deposited ZrO2/Al2O3/ZrO2 films for DRAM MIM capacitor applications
Publication:
Effect of deposition and anneal temperature on batch-ALD deposited ZrO2/Al2O3/ZrO2 films for DRAM MIM capacitor applications
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Date
2008
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Dilliway, G.
;
Pierreux, D.
;
Fischer, P.
;
Menou, Nicolas
;
Pawlak, Malgorzata
;
Wang, Xin Peng
;
Wouters, Dirk
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1973
since deposited on 2021-10-17
2
last month
Acq. date: 2026-01-25
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Statistics
Views
1973
since deposited on 2021-10-17
2
last month
Acq. date: 2026-01-25
Citations