Publication:
Effect of deposition and anneal temperature on batch-ALD deposited ZrO2/Al2O3/ZrO2 films for DRAM MIM capacitor applications
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1974 since deposited on 2021-10-17
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Acq. date: 2026-02-24
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Statistics
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1974 since deposited on 2021-10-17
1last month
1last week
Acq. date: 2026-02-24
Citations