Effect of UV irradiation on modification and subsequent wet removal of model and post-etch fluorocarbon residues

dc.contributor.author	Le, Quoc Toan
dc.contributor.author	de Marneffe, Jean-Francois
dc.contributor.author	Conard, Thierry
dc.contributor.author	Vaesen, Inge
dc.contributor.author	Struyf, Herbert
dc.contributor.author	Vereecke, Guy
dc.contributor.imecauthor	Le, Quoc Toan
dc.contributor.imecauthor	de Marneffe, Jean-Francois
dc.contributor.imecauthor	Conard, Thierry
dc.contributor.imecauthor	Vaesen, Inge
dc.contributor.imecauthor	Struyf, Herbert
dc.contributor.imecauthor	Vereecke, Guy
dc.contributor.orcidimec	Le, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimec	Conard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimec	Vereecke, Guy::0000-0001-9058-9338
dc.date.accessioned	2021-10-20T12:34:06Z
dc.date.available	2021-10-20T12:34:06Z
dc.date.issued	2012
dc.identifier.issn	0013-4651
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/20990
dc.source.beginpage	H208
dc.source.endpage	H213
dc.source.issue	3
dc.source.journal	Journal of the Electrochemical Society
dc.source.volume	159
dc.title	Effect of UV irradiation on modification and subsequent wet removal of model and post-etch fluorocarbon residues
dc.type	Journal article
dspace.entity.type	Publication
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