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High performance strained Germanium Gate All Around p-channel devices with excellent electrostatic control for sub-30 nm Lg
Publication:
High performance strained Germanium Gate All Around p-channel devices with excellent electrostatic control for sub-30 nm Lg
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Date
2019
Proceedings Paper
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40884.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Capogreco, Elena
;
Arimura, Hiroaki
;
Vohra, Anurag
;
Porret, Clément
;
Loo, Roger
;
De Keersgieter, An
;
Dupuy, Emmanuel
;
Marinov, Daniil
;
Hikavyy, Andriy
;
Sebaai, Farid
;
Mannaert, Geert
;
Ragnarsson, Lars-Ake
;
Siew, Yong Kong
;
Vrancken, Christa
;
Opdebeeck, Ann
;
Mitard, Jerome
;
Langer, Robert
;
Altamirano Sanchez, Efrain
;
Holsteyns, Frank
;
Demuynck, Steven
;
Barla, Kathy
;
De Heyn, Vincent
;
Mocuta, Dan
;
Collaert, Nadine
;
Horiguchi, Naoto
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Acq. date: 2025-12-10
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since deposited on 2021-10-27
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Acq. date: 2025-12-10
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Downloads
1
since deposited on 2021-10-27
Acq. date: 2025-12-10
Views
1935
since deposited on 2021-10-27
4
last month
Acq. date: 2025-12-10
Citations